WET process equipment, single-sided substrate cleaning equipment
The substrate will undergo various cleaning and drying processes through horizontal transport.
The WET process equipment for single-sided substrate cleaning performs UV cleaning, brush cleaning, shower spray cleaning, ultrasonic cleaning, and drying treatment while transporting the substrate horizontally. The WET equipment technology from Denshi Giken Co., Ltd., including cleaning and other spins, can meet the needs of a wide range of industries such as semiconductors, LCDs, medical, and food industries, by cleaning wafers, glass substrates, printed circuit boards, metal substrates, and more. 【Features】 ○ Improved hydrophilicity before shower spray cleaning using UV/O3 ○ Parallel processing of UV cleaning, shower spray cleaning, drying, and other processes ○ High efficiency of natural drop and replacement through substrate inclined washing function For more details, please contact us or download the catalog.
- Company：電子技研
- Price：Other
